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Wyszukujesz frazę "Wang, Fang" wg kryterium: Autor


Wyświetlanie 1-2 z 2
Tytuł:
Microstructure, Compressive Properties and Oxidation Behaviors of the Nb-Si-Ti-Cr-Al-Ta-Hf Alloy with Minor Holmium Addition
Autorzy:
Wang, Qiaoli
Xiao, Yinan
Wu, Di
Yang, Fang
Sheng, L. Y.
Tematy:
Nb alloy
Nb5Si3 phase
microstructure
mechanical properties
oxidation behavior
Pokaż więcej
Wydawca:
Polska Akademia Nauk. Czasopisma i Monografie PAN
Powiązania:
https://bibliotekanauki.pl/articles/59226018.pdf  Link otwiera się w nowym oknie
Opis:
In the present research, the Nb-Si-Ti-Cr-Al-Ta-Hf alloys with different Ho addition were prepared. Their microstructure, compressive properties and oxidation behaviors were investigated preliminarily. The results exhibit that the Nb-Si-Ti-Cr-Al-Ta-Hf alloy has coarse microstructure which is mainly composed of Nb solid solution, Nb5Si3 and Ti5Si3 phases. The minor Ho addition could refine the microstructure and suppress the precipitation of Ti5Si3 phase. Moreover, the Ho addition also leads to the formation of Ho2Hf2O7, which prefers to precipitate along the Nbss/Nb5Si3 phase interface. Compared with the Nb-Si-Ti-Cr-Al-Ta-Hf alloy, the minor Ho addition improves the room-temperature and high-temperature compressive properties of the alloy. Its room-temperature compressive strength and ductility obtain the maximum value of 1825 MPa and 16.5% when the Ho content is 0.1 at.%. Moreover, its best compressive strength at 873 K, 1273 K and 1473 K is 1495 MPa, 765 MPa and 380 MPa, respectively, when the Ho addition is 0.1 at.%. The oxidation behavior of the Nb-Si-Ti-Cr-Al-Ta-Hf alloy is diversified with the Ho addition. The oxidation rate of the alloy with 0.1 at.% Ho addition is the lowest while the alloy with 0.2 at.% Ho addition is the highest. Therefore, the 0.1 at.% Ho would be the appropriate content for the Nb-Si-Ti-Cr-Al-Ta-Hf alloy.
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Effect of Ultraviolet Absorber on Photo-Degradation of Epoxy Coating Studied by Slow Positron Beam
Autorzy:
Wang, Zheng
Liu, Fuwei
Li, Jingjing
He, Chunqing
Peng, Xiangyang
Huang, Zhen
Fang, Pengfei
Tematy:
epoxy coating
photo-degradation
ultraviolet absorber
slow positron beam
microstructure
Pokaż więcej
Wydawca:
Polska Akademia Nauk. Instytut Fizyki PAN
Powiązania:
https://bibliotekanauki.pl/articles/1033239.pdf  Link otwiera się w nowym oknie
Opis:
The photo-degradation progress of epoxy coating and the effect of ultraviolet absorber under UV-B irradiation have been investigated in slow positron beam and by the Fourier transform infrared spectrometer. After 120 h of irradiation, the value of S parameter in sample bulk is reduced while compared with the virgin sample. The result is mostly due to post-cure process happening in this initial irradiation stage. As the irradiation time increases to 360 h, the S parameter decreases sharply. This is due to the growth of carbonyl group and the generation of free radical. After 528 h or longer time of irradiation, a very low S value was obtained near sample surface, indicating the formation of a dead surface layer. Positron results also reveal that the addition of ultraviolet absorber suppresses the development of the dead layer after long-term UV-B irradiation. Ultraviolet absorber has a suppressing effect on generation of polar groups towards sample bulk. The addition of ultraviolet absorber is a key factor that affects the photo-degradation of epoxy coating.
Dostawca treści:
Biblioteka Nauki
Artykuł
    Wyświetlanie 1-2 z 2

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