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Wyszukujesz frazę "plasma processing" wg kryterium: Temat


Tytuł:
Plasma gasification of waste plastics
Autorzy:
Mączka, T
Śliwka, E.
Wnukowski, M
Tematy:
plasma processing
plastic
fuel fractions
Pokaż więcej
Wydawca:
Polskie Towarzystwo Inżynierii Ekologicznej
Powiązania:
https://bibliotekanauki.pl/articles/123383.pdf  Link otwiera się w nowym oknie
Opis:
The article presents the process of obtaining liquid fuels and fuel gas in the process of plasma processing of organic materials, including waste plastics. The concept of plasma pyrolysis of plastics was presented and on its basis a prototype installation was developed. The article describes a general rule of operating the installation and its elements in the process and basic operation parameters determined during its startup. Initial results of processing plastics and the directions of further investigations are also discussed. The effect of the research is to be the design of effective technology of obtaining fuels from gasification/pyrolysis of organic waste and biomass.
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Present status and prospects of research in SINS on the modification of surface properties by pulsed plasma streams
Autorzy:
Langner, J.
Piekoszewski, J.
Stanisławski, J.
Werner, Z.
Tematy:
IONOTRON plasma injector
pulsed plasma processing
surface modification
Pokaż więcej
Wydawca:
Instytut Chemii i Techniki Jądrowej
Powiązania:
https://bibliotekanauki.pl/articles/146758.pdf  Link otwiera się w nowym oknie
Opis:
The paper presents examples of the most important results obtained in SINS during the last decade, interesting from the point of view of industrial applications. It also indicates some of the most prospective directions in research on modification of the surface properties of materials by means of pulsed plasma streams.
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Investigation of low temperature plasma capabilities to modify the structure and function of bio-polymers
Autorzy:
Motrescu, I.
Hara, T.
Ogino, A.
Tanaka, S.
Fujiwara, T.
Kawagishi, H.
Kodani, S.
Popa, G.
Nagatsu, M.
Tematy:
biopolymers
biomolecules
low temperature plasma
modification
plasma processing
Pokaż więcej
Wydawca:
Sieć Badawcza Łukasiewicz - Przemysłowy Instytut Automatyki i Pomiarów
Powiązania:
https://bibliotekanauki.pl/articles/385288.pdf  Link otwiera się w nowym oknie
Opis:
The possibility to modify biopolymers using low temperature plasma is investigated. Two types of plasma are employed in this study: an atmospheric pressure plasma and a low pressure microwave plasma. In both cases changes of the structure and function of the exposed molecules are reported, the effects being stronger for the low-pressure plasma irradiation.
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Ultra-shallow nitrogen plasma implantation for ultra-thin silicon oxynitride (SiOxNy) layer formation
Autorzy:
Bieniek, T.
Beck, R. B.
Jakubowski, A.
Kudła, A.
Tematy:
MOS technology
plasma processing
shallow implantation
radiation damage
Pokaż więcej
Wydawca:
Instytut Łączności - Państwowy Instytut Badawczy
Powiązania:
https://bibliotekanauki.pl/articles/308830.pdf  Link otwiera się w nowym oknie
Opis:
The radiation damage caused by low energy r.f. plasmas has not been, to our knowledge, studied so far in the case of symmetric planar plasma reactors that are usually used for PECVD processes. The reason is that, unlike nonsymmetrical RIE reactors, such geometry prevents, basically, high-energy ion bombardment of the substrate. In this work, we present the results of experiments in which we have studied the influence of plasma processing on the state of silicon surface. Very low temperature plasma oxidation has been used as a test of silicon surface condition. The obtained layers were then carefully measured by spectroscopic ellipsometry, allowing not only the thickness to be determined accurately, but also the layer composition to be evaluated. Different plasma types, namely N2, NH3 and Ar, were used in the first stage of the experiment, allowing oxidation behaviour caused by the exposure to those plasma types to be compared in terms of relative differences. It has been clearly proved that even though the PECVD system is believed to be relatively safe in terms of radiation damage, in the case of very thin layer processing (e.g., ultra-thin oxynitride layers) the effects of radiation damage may considerably affect the kinetics of the process and the properties of the formed layers.
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Obtaining biocompatibile protective coatings on titanium alloys to artificial medical instrument
Autorzy:
Zagirskyi, A.
Ivashchenco, I.
Panarin, V.
Tematy:
biocompatibility
segregation
ascending diffusion
ion-plasma processing
biocompatible layers
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Wydawca:
Fundacja na Rzecz Młodych Naukowców
Powiązania:
https://bibliotekanauki.pl/articles/115939.pdf  Link otwiera się w nowym oknie
Opis:
Titanium is a metal that has been used in various and varied medical applications for about 40 years. Titanium and its alloys have excellent corrosion resistance, in many aqueous media, and assure their excellent biocompatibility. A variety of surface modification processes have been proposed for titanium alloys. The new method of creation biocompatible layers on titanium-aluminium alloys that we want to investigate is based on the use of ascending diffusion effect of solute atoms at sputtering of metal-solvent surface by inert gases ions. Using theoretical calculations technique described, it is possible to choose modes for carrying out ion-plasma processing aimed at getting the effect of ascending diffusion in titanium-aluminium alloy.
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Ultrathin oxynitride films for CMOS technology
Autorzy:
Beck, R.B.
Jakubowski, A.
Tematy:
MOS technology
gate stack
ultrathin oxynitride layers
high temperature processing
plasma processing
Pokaż więcej
Wydawca:
Instytut Łączności - Państwowy Instytut Badawczy
Powiązania:
https://bibliotekanauki.pl/articles/308025.pdf  Link otwiera się w nowym oknie
Opis:
In this work, a review of possible methods of oxynitride film formation will be given. These are different combinations of methods applying high-temperature oxidation and nitridation, as well as ion implantation and deposition techniques. The layers obtained using these methods differ, among other aspects in: nitrogen content, its profile across the ultrathin layer,... etc., which have considerable impact on device properties, such as leakage current, channel mobility, device stability and its reliability. Unlike high-temperature processes, which (understood as a single process step) usually do not allow the control of the nitrogen content at the silicon-oxynitride layer interface, different types of deposition techniques allow certain freedom in this respect. However, deposition techniques have been believed for many years not to be suitable for such a responsible task as the formation of gate dielectrics in MOS devices. Nowadays, this belief seems unjustified. On the contrary, these methods often allow the formation of the layers not only with a uniquely high content of nitrogen but also a very unusual nitrogen profile, both at exceptionally low temperatures. This advantage is invaluable in the times of tight restrictions imposed on the thermal budget (especially for high performance devices). Certain specific features of these methods also allow unique solutions in certain technologies (leading to simplifications of the manufacturing process and/or higher performance and reliability), such as dual gate technology for system-on-chip (SOC) manufacturing.
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Plasma assisted attachment of functionalized carbon nanotubes on poly(ethylene terephthalate) fabric to improve the electrical conductivity
Poprawa przewodności elektrycznej tkaniny z poli(tereftalanu etylenu) przez wspomagane obróbką plazmową nanoszenie funkcjonalizowanych nanorurek węglowych
Autorzy:
Haji, A.
Rahbar, R. S.
Shoushtari, A. M.
Tematy:
coating
conductive textiles
carbon nanotubes
functionalization
plasma processing
powlekanie
tkaniny przewodzące
nanorurki węglowe
funkcjonalizacja
obróbka plazmowa
Pokaż więcej
Wydawca:
Sieć Badawcza Łukasiewicz - Instytut Chemii Przemysłowej
Powiązania:
https://bibliotekanauki.pl/articles/945844.pdf  Link otwiera się w nowym oknie
Opis:
In this article, we report a durable coating of polyester fabric with carbon nanotubes. Four fabric samples were prepared using different treatments to obtain the fabric with the lowest electrical resistance. Plasma treatment was performed to prepare the fabric surface for depositing amino functionalized carbon nanotubes (NH2-MWCNT). Thermal properties, surface morphology and chemistry of the samples were investigated. Also color strength and electrical resistance of the fabric samples were determined. The results showed that the attachment of NH2-MWCNT onto polyester fabric was affected by fabric surface morphology. The XPS results confirmed the presence of more oxygen-containing species on the PET fabric surface after plasma treatment and NH2-MWCNT coating. The melting temperature and degree of crystallinity of the coated-PET fabric were higher than those of the pristine PET fabric. An improvement in the tensile strength of the PET fabric was also obtained after the plasma treatment and CNT coating. Electrical resistance of NH2-MWCNT coated polyester fabric reduced substantially for pretreated fabric with plasma which was subsequently coated with NH2-MWCNT in the presence of acrylic acid.
W ramach pracy badano różne metody nanoszenia na powierzchnię tkaniny z poli(tereftalanu etylenu) (PET) trwałej powłoki z nanorurek węglowych w celu uzyskania materiałów o najmniejszej oporności elektrycznej. Przygotowano cztery próbki tkaniny PET, z których trzy poddano obróbce plazmowej. Następnie wszystkie próbki moczono w dyspersji funkcjonalizowanych aminą nanorurek węglowych (NH2-MWCNT) działając ultradźwiękami w ciągu 5 min. W przypadku dwóch tkanin, które moczono w dyspersji różniącej się stężeniem NH2-MWCNT po 5 min dodawano kwas akrylowy i utrzymywano działanie ultradźwięków przez kolejne 5 min. Wszystkie cztery próbki tkanin oraz próbkę referencyjną, z wyjściowej tkaniny PET poddano badaniom właściwości termicznych, morfologii powierzchni i składu chemicznego. Określono również intensywność ich barwy i oporność elektryczną. Stwierdzono, że ilość NH2-MWCNT naniesionego na tkaninę PET zależy od morfologii jej powierzchni. Wyniki rentgenowskiej spektroskopii fotoelektronowej (XPS) wykazały, że na powierzchni tkaniny PET powlekanej NH2-MWCNT po wstępnej obróbce plazmowej znalazła się większa ilość cząsteczek zawierających tlen, niż na tkaninie bez takiej obróbki. Temperatura topnienia (Tm) i stopień krystaliczności (Xc) w przypadku powlekanych tkanin PET były wyższe niż w wyjściowej tkaninie PET. Obróbka plazmowa zwiększyła także wytrzymałość na rozciąganie powlekanych tkanin. Stwierdzono, że oporność elektryczna była najniższa w przypadku tkanin powlekanych NH2-MWCNT po wstępnej obróbce plazmowej i w obecności kwasu akrylowego.
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Post-processing of titanium 3D printouts with radio frequency plasma
Autorzy:
Grabarczyk, Jacek
Jastrzębski, Krzysztof
Wrotniak, Maciej
Tematy:
post-processing
plasma treatment
3D printing
titanium printouts
RF plasma
Pokaż więcej
Wydawca:
Akademia Górniczo-Hutnicza im. Stanisława Staszica w Krakowie. Polskie Towarzystwo Biominerałów
Powiązania:
https://bibliotekanauki.pl/articles/1844865.pdf  Link otwiera się w nowym oknie
Opis:
Additive manufacturing is a technology of great interest for biomedical engineering and medicine since it enables to mimic natural structures. The 3D printouts require post-processing to ensure desired surface properties and interaction with living matter. The presented research focuses on novel approaches involving plasma treatment of Ti6Al4V scaffolds obtained by Direct Metal Printing. Solid samples and scaffolds of two various geometries were treated in atmospheres of pure argon, argon and oxygen or pure oxygen. The effect of post-processing was evaluated with scanning electron microscopy, measurements of mass, and surface roughness. In all the examined cases the proposed post-processing method reduces the amount of loosely bonded powder particles remaining after printing. The changes of mass before and after the treatment are much lower than in the case of popular wet chemical methods. The character of undergoing post-processing depends on the process atmosphere resulting in physical etching or the combination of physical etching and chemical oxidation. The action of argon or argon/ oxygen plasma reduces mass to the level of only 1% while by use of pure oxygen atmosphere even the slight increase of the overall sample mass is observed. The plasma etching was successfully introduced for the treatment of titanium 3D printouts to minimize the detachment of powder particles. That method not only is much softer than chemical etching but it can also lead to specific surface structurization that may be beneficial regarding medical applications of such printouts.
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Tomographic system based on Plasma Focus X-rays
Autorzy:
Venere, M.
Moreno, C. H.
Clausse, A.
Barbuzza, R.
Del Fresno, M.
Tematy:
defectoscopy
image processing
plasma focus applications
tomographic reconstruction
X-rays
Pokaż więcej
Wydawca:
Instytut Chemii i Techniki Jądrowej
Powiązania:
https://bibliotekanauki.pl/articles/147461.pdf  Link otwiera się w nowym oknie
Opis:
A system oriented to develop an image processing system, which takes advantage of radiation flashes from a plasma focus, by optimizing the emission-detection-reconstruction procedure, is presented. A computer technique for 3D reconstructions was combined with radiographic images of objects X-rayed with a compact plasma focus. The technique is able to automatically determine the position of the rotation axis, reconstruct the 3D-attenuation map, and display inner cuts. The system was demonstrated in introspective tomographic imaging of a stainless steel BNC elbow.
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Development of Methodological, Hardware, and Software of the Incoherent Scatter Radar of Institute of Ionosphere (Kharkiv, Ukraine)
Autorzy:
Emelyanov, Leonid
Miroshnikov, Artem
Tematy:
incoherent scatter radar
incoherent scatter signal
signal reception and processing
ionospheric plasma parameter
Pokaż więcej
Wydawca:
Polska Akademia Nauk. Czasopisma i Monografie PAN
Powiązania:
https://bibliotekanauki.pl/articles/27311912.pdf  Link otwiera się w nowym oknie
Opis:
We present the met determinate hodological features and new subsystem for receiving, digitizing and processing signals at the intermediate frequency of the incoherent scatter (IS) radar. The implemented method, subsystem and flexible software made it possible to avoid the influence of a number of instrumental factors on the accuracy of determining the quadrature components of the IS signal correlation function used to determine the ionospheric parameters, to adapt the digital filtering parameters, the value of the correlation delay step and the number of ordinates of the measured correlation function to IS signals from different altitudes and under different space weather conditions, to effectively test radar systems for the subsequent taking into account hardware factors and, thus, to improve the accuracy of the measured ionospheric parameters. The experimental results are presented.
Dostawca treści:
Biblioteka Nauki
Artykuł

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