Temat: sputtering - Prolib Integro

Skocz do pozycji: 1.

Tytuł:: Wytwarzanie ultra cienkich warstw z wykorzystaniem line 440 sputtering system
Ultra thin layer preparation with using the line 440 sputtering system
Autorzy:: Lubańska, Z.
Grudniewski, T.
Chodyka, M.
Tematy:: elektronika
sputtering magnetronowy
plazma
electronic
magnetron sputtering
plasma; Pokaż więcej
Data publikacji:: 2015
Powiązania:: https://bibliotekanauki.pl/articles/250357.pdf Link otwiera się w nowym oknie
Źródło:: TTS Technika Transportu Szynowego; 2015, 12; 2693-2695
1232-3829
2543-5728
Pojawia się w:: TTS Technika Transportu Szynowego
Opis:: W artykule omówiono jedną z możliwych technik nanoszenia cienkich warstw na podłoża szklane jaką jest sputtering magnetronowy. Metoda polega na nanoszeniu na przygotowane podłoża, materiałów w wyniku rozpylania plazmowego. LINE 440 jest aparaturą najnowszej generacji wykorzystywaną do celów naukowo-badawczych w Centrum Badań nad Innowacjami przy Państwowej Szkole Wyższej w Białej Podlaskiej.
The article describes one of the possible techniques for thin films preparation on glass substrates. The method involves applying to the surface of sample externally controlled media, which is sprayed in a magnetic field and then deposited onto a substrate. Line 440 is the latest generation apparatus used for the purposes of research at the Center for Innovation Research at the State School in Biala Podlaska.
Dostawca treści:: Biblioteka Nauki

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Skocz do pozycji: 2.

Tytuł:: Fotoaktywne powłoki dwutlenku tytanu osadzane reaktywną metodą gas impulse magnetron sputtering (GIMS)
Photoactive titanium dioxide thin films deposited by reactive gas impulse magnetron sputtering (GIMS)
Autorzy:: Jakubowska, M.
Tematy:: TiO2
magnetron sputtering
Gas Impulse Magnetron Sputtering; Pokaż więcej
Data publikacji:: 2016
Powiązania:: https://bibliotekanauki.pl/articles/134853.pdf Link otwiera się w nowym oknie
Źródło:: Technical Issues; 2016, 3; 53-59
2392-3954
Pojawia się w:: Technical Issues
Opis:: Titanium dioxide (TiO2) is one of the most extensively studied metal oxides, also in a form of thin films. It is a polymorphous material known to exist in three crystalline forms, two tetragonal (anatase and rutile) and one orthorhombic (brookite). In the present paper, the way of deposition of thin films of rutile with the help of reactive magnetron sputtering in pure oxygen introduced to the vacuum chamber in the form of short gas pulses is presented. Compared to typical reactive magnetron sputtering, this novel deposition technique, known as gas impulse magnetron sputtering (GIMS), has an advantage of a minimal target poisoning and stechiometric TiO2. Properties of the films deposited on medical grade Ti6Al7Nb alloy were investigated with the use of SEM, EDS, GI-XRD and FTIR. Their photoactivity was determined by the measurements of water and diiodomethane wetting angles after UV light illumination of different duration, varying between 5 and 25 minutes. In addition, the bactericidal activity of the illuminated TiO2 films in contact with E. Coli bacteria was tested using a live-dead test. It has been found that 200-400nm thick stechiometric films of reactive GIMS deposited rutile and anatase are characterised by very fine nanostructure and strong photoactivity.
Dostawca treści:: Biblioteka Nauki

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Skocz do pozycji: 3.

Tytuł:: Analiza wpływu trawienia powierzchni w procesie sputteringu magnetronowego
Etching effect analysis in the process of magnetron sputtering
Autorzy:: Grudniewski, T.
Chodyka, M.
Lubańska, Z.
Tematy:: trawienie powierzchni
sputtering magnetronowy
surface etching
sputtering magnetron; Pokaż więcej
Data publikacji:: 2015
Powiązania:: https://bibliotekanauki.pl/articles/250398.pdf Link otwiera się w nowym oknie
Źródło:: TTS Technika Transportu Szynowego; 2015, 12; 624-626, CD
1232-3829
2543-5728
Pojawia się w:: TTS Technika Transportu Szynowego
Opis:: W prezentowanym artykule, autorzy starają się zwrócić uwagę na proces wstępnego przygotowania próbek do nanoszenia warstw metodą sputteringu magnetronowego. Wykorzystywaną metodą w urządzeniu, na którym przeprowadzono badania proces ten polega na bombardowaniu powierzchni próbki plazmą i wytrawianiu jej górnych warstw. Autorzy postanowili zatem zbadać jaki wpływ ma trawienie na próbkę oraz czy wybite z próbki atomy materiału mogą być osadzone na innym podłożu. Dodatkowo przeanalizowano jedną z możliwości modyfikacji kształtu plazmy poprzez wprowadzenie, do komory roboczej, bardzo silnych magnesów.
In this paper, the authors pay attention to the pre-treatment process for creating layers by magnetron sputtering. The method used by the device on which the study was conducted involves bombarding the sample surface plasma and etching the upper layers. The authors therefore decided to investigate what impact the digestion of the sample has and whether the sample atoms knocked out of the material can be embedded on other substrates. In addition, one possible modification of the plasma shape was analyzed by introducing very strong magnets into the working chamber.
Dostawca treści:: Biblioteka Nauki

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Skocz do pozycji: 4.

Tytuł:: Structure and Electrical Resistivity Dependence of Molybdenum Thin Films Deposited by DC Modulated Pulsed Magnetron Sputtering
Autorzy:: Wicher, B.
Chodun, R.
Nowakowska-Langier, K.
Okrasa, S.
Król, K.
Minikayev, R.
Strzelecki, G.
Zdunek, K.
Tematy:: magnetron sputtering
modulated pulse magnetron sputtering
plasma&films characterization; Pokaż więcej
Data publikacji:: 2018
Powiązania:: https://bibliotekanauki.pl/articles/350987.pdf Link otwiera się w nowym oknie
Źródło:: Archives of Metallurgy and Materials; 2018, 63, 3; 1339-1344
1733-3490
Pojawia się w:: Archives of Metallurgy and Materials
Opis:: This work reports the results of a study of Mo thin films synthesis by DC Pulsed Magnetron Sputtering method (PMS), operating at pulse main frequency of 100 kHz and modulated by the additional modulation frequency, driving in the range of 5-1000 Hz (modulated Pulse Magnetron Sputtering – mPMS). We have studied the influence of mPMS on plasma chemical reactions and mechanisms of layer growth using optical emission spectroscopy technique. Our experiment showed strong influence of mPMS method, on the morphology (scanning electron microscopy), phase composition (X-ray diffractometry) and electric properties (4-point probes method) of nanocrystalline and amorphous Mo films. From the utilitarian point of view, low value of resistivity – 43,2 μΩcm of synthesized Mo films predestines them as back contacts for thin solar cells CIGS. Our results revealed that additional modulation frequency should be considered as an important factor for optimization of films synthesis by means of PMS-based methods.
Dostawca treści:: Biblioteka Nauki

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Skocz do pozycji: 5.

Tytuł:: Effect of Sample Thickness on Carbon Ejection from Ultrathin Graphite Bombarded by keV C_{60}
Autorzy:: Golunski, M.
Postawa, Z.
Tematy:: Computer simulations
sputtering
graphene; Pokaż więcej
Data publikacji:: 2017-08
Powiązania:: https://bibliotekanauki.pl/articles/1030136.pdf Link otwiera się w nowym oknie
Źródło:: Acta Physica Polonica A; 2017, 132, 2; 222-224
0587-4246
1898-794X
Pojawia się w:: Acta Physica Polonica A
Opis:: Molecular dynamics computer simulations are employed to investigate the effect of a sample thickness on the ejection process from ultrathin graphite. The thickness of graphite varies from 2 to 16 graphene layers and the system is bombarded by 10 keV C₆₀ projectiles at normal incidence. The ejection yield and the kinetic energy of emitted atoms are monitored. The implications of the results to a novel analytical approach in secondary ion mass spectrometry based on the ultrathin free-standing graphene substrates and transmission geometry are discussed.
Dostawca treści:: Biblioteka Nauki

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Skocz do pozycji: 6.

Tytuł:: Sterowanie procesem reaktywnego rozpylania magnetronowego
Process control of reactive magnetron sputtering
Autorzy:: Stec, A.
Tematy:: reaktywne rozpylanie
magnetron
reactive sputtering; Pokaż więcej
Data publikacji:: 2005
Powiązania:: https://bibliotekanauki.pl/articles/156298.pdf Link otwiera się w nowym oknie
Źródło:: Pomiary Automatyka Kontrola; 2005, R. 51, nr 1, 1; 53-55
0032-4140
Pojawia się w:: Pomiary Automatyka Kontrola
Opis:: W pracy przedstawiono wybrane zagadnienia związane ze sterowaniem procesem rektywnego rozpylania magnetronowego. Omówiono najczęściej stosowane metody sterowania. Przedstawiono zależność opisującą charakterystykę prądowo-napięciową oraz sposób modelowania dynamiki procesu związanego z reaktywnym rozpylaniem. Zaproponowano układ regulacji do pracy w trybie przejściowym.
Some aspects of reactive sputtering process control are presented. Most popular control methods are described. current-voltage relation and modelling dynamics of reactive sputtering are presented. Block diagram of a feedback system is proposed.
Dostawca treści:: Biblioteka Nauki

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Skocz do pozycji: 7.

Tytuł:: Biological evaluation and surface properties of Ti-DLC coatings deposited by magnetron sputtering
Autorzy:: Olejnik, A
Sobczyk-Guzenda, A.
Świątek, L.
Jastrzębski, K.
Bociąga, D.
Tematy:: DLC coatings
magnetron sputtering
implants; Pokaż więcej
Data publikacji:: 2016
Powiązania:: https://bibliotekanauki.pl/articles/285544.pdf Link otwiera się w nowym oknie
Źródło:: Engineering of Biomaterials; 2016, 19, 138; 105
1429-7248
Pojawia się w:: Engineering of Biomaterials
Opis:: During the last few decades, a growing demand for medical implants may be observed on the market. This is a consequence of both the increasing number of people suffering from disabilities as well as technological development. As a result of growing number of trauma injuries, orthopaedic and bone implants are one of the branches of the medical device industry showing the fastest growth opportunities. However, the commonly applied metallic implants do not exhibit total chemical stability in human body environment and hence, possess relatively poor surface properties [1]. For that reason, even the corrosion resistant metals may release degradation products and cause adverse biological response1. Consequently, surface modifications of metallic implants which enhance the biological response of the human body towards the surface of the implant are recently gaining a lot of interest. One of the most extensively studied solutions include the application of diamond-like carbon (DLC) coatings which exhibit a combination of highly desirable properties in the context of biomedical applications [2]. Furthermore, the properties of DLC coatings, such as cell behaviour and body reaction towards its surface, may be further improved by doping with various elements [3]. Therefore, the modified DLC coatings are nowadays extensively researched in terms of their possible medical applications. In the case of orthopaedic implants the enhancement of the osseointegration process is highly desirable in order to assure the proper bone-healing, what according to the literature may be achieved by the addition of titanium (Ti). The incorporation of Ti into the DLC matrix does not only promote the bone marrow cells proliferation, but also simultaneously reduces the activity of the osteoclast-like cells as indicated by Shroeder et al. [4]. Similarly, also Thorwarth et al. demonstrated that carbon coatings containing TiO exhibit promising results concerning the proliferation and differentiation of human osteoblasts [5]. Nevertheless, in spite of the numerous studies considering the biological behaviour of Ti-incorporated DLC coatings, there is lack of conclusive reports considering the biological applications of coatings deposited by a magnetron sputtering technique. Taking this into consideration, a complex biological evaluation of Ti-DLC coatings followed by their surface characteristics was performed, since surface properties have a direct role in different post-implantation reactions including protein adsorption and cell proliferation [1]. The examined coatings were deposited on two commonly applied metallic biomaterials (AISI 316 LVM steel and Ti6Al7Nb alloy) using a magnetron sputtering technique. The surface characteristics of the deposited Ti-DLC coatings included the analysis of surface morphology (SEM), chemical composition and structure (XPS, FTIR) as well as surface wettability and surface free energy (sessile drop technique and Owens-Wendt’s model). The biological assessment of the deposited coatings was based on two complementary cell proliferation and viability assays (LIVE/DEAD and XTT test) performed with the use of two different cell lines, i.e. endothelial cells line EA.hy926 and osteoblast-like cells line Saos-2. The obtained results allowed to check the influence of titanium on the biological response of two different cell lines towards the Ti-DLC coatings deposited using magnetron sputtering method as well as to correlate the obtained results with the surface properties of the investigated coatings.
Dostawca treści:: Biblioteka Nauki

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Skocz do pozycji: 8.

Tytuł:: Investigation of mechanical and anticorrosive properties of ZrC coatings deposited by magnetron sputtering technique
Autorzy:: Szparaga, Ł.
Mydłowska, K.
Dobruchowska, E.
Bartosik, P.
Gilewicz, A.
Ratajski, J.
Tematy:: coatings
biomaterials
magnetron sputtering technique; Pokaż więcej
Data publikacji:: 2018
Powiązania:: https://bibliotekanauki.pl/articles/286251.pdf Link otwiera się w nowym oknie
Źródło:: Engineering of Biomaterials; 2018, 21, 148; 73
1429-7248
Pojawia się w:: Engineering of Biomaterials
Dostawca treści:: Biblioteka Nauki

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Skocz do pozycji: 9.

Tytuł:: Nichrome Capacitors on Polycarbonate Substrate for Monitoring Cell Culture Using Impedance Sensing Technique
Autorzy:: Kociubiński, A.
Zarzeczny, D.
Prendecka, M.
Pigoń, D.
Małecka-Massalska, T.
Tematy:: bioimpedance
ecis
sputtering
nichrome
fibroblast; Pokaż więcej
Data publikacji:: 2020
Powiązania:: https://bibliotekanauki.pl/articles/355589.pdf Link otwiera się w nowym oknie
Źródło:: Archives of Metallurgy and Materials; 2020, 65, 1; 493-496
1733-3490
Pojawia się w:: Archives of Metallurgy and Materials
Opis:: The aim of this work was to present a method of tissue culture research by measuring the impedance of cells cultured in the presence of nichrome. For this purpose, the Electric Cell-substrate Impedance Sensing system was used with a prototype substrate containing comb capacitors made of nichrome. Magnetron sputtering, photolithography and etching processes were used to produce the thin-film electrodes. In the experimental part, cells of mouse fibroblast cell line L929 were cultured according to the instruction manual in complete medium, under controlled growth conditions. Inoculation of arrays was carried out by 300 microliters per well of cell suspension at ~1.2×105 cells/ml. The results of the monitoring cells behavior in tissue culture indicate good cell viability and proliferative potential.
Dostawca treści:: Biblioteka Nauki

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Skocz do pozycji: 10.

Tytuł:: The role of magnetic energy on plasma localization during the glow discharge under reduced pressure
Autorzy:: Chodun, R.
Nowakowska-Langier, K.
Zdunek, K.
Okrasa, S.
Tematy:: glow discharge
grounded magnetron
magnetron sputtering; Pokaż więcej
Data publikacji:: 2016
Powiązania:: https://bibliotekanauki.pl/articles/147975.pdf Link otwiera się w nowym oknie
Źródło:: Nukleonika; 2016, 61, 2; 191-194
0029-5922
1508-5791
Pojawia się w:: Nukleonika
Opis:: In this work, we present the first results of our research on the synergy of fields, electric and magnetic, in the initiation and development of glow discharge under reduced pressure. In the two-electrode system under reduced pressure, the breakdown voltage characterizes a minimum energy input of the electric field to initiate and sustain the glow discharge. The glow discharge enhanced by the magnetic field applied just above the surface of the cathode influences the breakdown voltage decreasing its value. The idea of the experiment was to verify whether the contribution of potential energy of the magnetic field applied around the cathode is sufficiently effective to locate the plasma of glow discharge to the grounded cathode, which, in fact, is the part of a vacuum chamber wall (the anode is positively biased in this case). In our studies, we used the grounded magnetron unit with positively biased anode in order to achieve favorable conditions for the deposition of thin films on fibrous substrates such as fabrics for metallization, assuming that locally applied magnetic field can effectively locate plasma. The results of our studies (Paschen curve with the participation of the magnetic field) seem to confirm the validity of the research assumption. What is the most spectacular – the glow discharge was initiated between introduced into the chamber anode and the grounded cathode of magnetron ‘assisted’ by the magnetic field (discharge did not include the area of the anode, which is a part of the magnetron construction).
Dostawca treści:: Biblioteka Nauki

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