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Wyszukujesz frazę "SiGe" wg kryterium: Temat


Tytuł:
SiGe field effect transistors - performance and applications
Autorzy:
Whall, T.E.
Parker, E.H.C.
Tematy:
SiGe
FETs
epitaxy
circuits
Pokaż więcej
Wydawca:
Instytut Łączności - Państwowy Instytut Badawczy
Powiązania:
https://bibliotekanauki.pl/articles/307664.pdf  Link otwiera się w nowym oknie
Opis:
Recent and encouraging developments in Schotky and MOS gated Si/SiGe field effect transistors are surveyed. Circuit applications are now beginning to be investigated. The authors discuss some of this work and consider future prospects for the role of SiGe field effect devices in mobile communications.
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Silicon microelectronics: where we have come from and where we are heading
Autorzy:
Łukasiak, L.
Jakubowski, A.
Pióro, Z.
Tematy:
MOSFET
scaling
SiGe
SOI
Pokaż więcej
Wydawca:
Instytut Łączności - Państwowy Instytut Badawczy
Powiązania:
https://bibliotekanauki.pl/articles/308029.pdf  Link otwiera się w nowym oknie
Opis:
The paper briefly presents the history of microelectronics and the limitations of its further progress, as well as possible solutions. The discussion includes the consequences of the reduction of gate-stack capacitance and difficulties associated with supply-voltage scaling, minimization of parasitic resistance, increased channel doping and small size. Novel device architectures (e.g. SON, double-gate transistor) and the advantages of silicon-germanium are considered, too.
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
CVD growth of high speed SiGe HBTs using SiH4
Autorzy:
Radamson, H.H.
Grahn, J.
Landgren, G.
Tematy:
SiGe
epitaxy
HBT
silane
Pokaż więcej
Wydawca:
Instytut Łączności - Państwowy Instytut Badawczy
Powiązania:
https://bibliotekanauki.pl/articles/309308.pdf  Link otwiera się w nowym oknie
Opis:
The growth of high frequency HBT structures using silane-based epitaxy has been studied. The integrity of SiGe layers in the base and the control of the collector profile using As- or P-doping grown at 650°C have been investigated. The results showed that the growth rate of SiGe layers has a strong effect on the evolution of defect density in the structure. Furthermore, B-doped SiGe layers have a higher thermal stability compared to undoped layers. The analysis of the collector profiles showed a higher incorporation of P in silane-based epitaxy compared to As. Meanwhile, the growth of As- or P-doped layers on the patterned substrates suffered from a high loading effect demanding an accurate calibration.
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Silicon-germanium for ULSI
Autorzy:
Hall, S.
Eccleston, B.
Tematy:
silicon-germanium
HBT
SiGe-CMOS
Pokaż więcej
Wydawca:
Instytut Łączności - Państwowy Instytut Badawczy
Powiązania:
https://bibliotekanauki.pl/articles/309304.pdf  Link otwiera się w nowym oknie
Opis:
The paper describes recent progress for the introduction of silicon-germanium, bipolar and field effect heterostructure transistors into mainstream integrated circuit application. Basic underlying concepts and device architectures which give rise to the desired performance advantages are described together with the latest state-of the-art results for HBT and MOSFET devices. The integration of such devices into viable HBT, BiCMOS and CMOS is reviewed. Other contributions that SiGe can make to enhance the performance of ULSI circuits are mentioned also.
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Nanohills in SiGe/Si structure formed by laser radiation
Autorzy:
Medvid', A.
Onufrijev, P.
Lyutovich, K.
Oehme, M.
Kasper, E.
Dmitruk, I.
Pundyk, I.
Manak, I.
Grabovskis, D.
Tematy:
nanohills
SiGe
laser
hetero-epitaxial structure
Pokaż więcej
Wydawca:
Sieć Badawcza Łukasiewicz - Przemysłowy Instytut Automatyki i Pomiarów
Powiązania:
https://bibliotekanauki.pl/articles/384291.pdf  Link otwiera się w nowym oknie
Opis:
Formation of self-assembling nanohills induced by irradiation of nanosecond Nd:YAG laser pulses on the Si0.7Ge0.3/Si hetero-epitaxial structures is reported. The atomic force microscope study of the irradiated surface morphology has shown a start of nanohills formation after laser irradiation of the intensity I=7.0 MW/cm2. The giant "blue shift" of photoluminescence spectra with maximum intensity in region of 700-800 nm (1.76 - 1.54 eV) is explained by the Quantum confinement effect in the nanohills. The maximum of this photoluminescence band slightly shifts to shorter wavelengths with the increase of the intensity of laser pulses used for sample treatment. Appearance of the 300 cm-1 Ge-Ge vibration band in Raman scattering spectra for sample irradiated with I=20.0MW/cm2 is explained by Ge phase formation. Formation of the Ge-rich phase is explained by localization of Ge atoms drifting toward the irradiated surface under the thermal gradient due to strong absorption of laser radiation.
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Modeling of the inverse base width modulation effect in HBT transistor with graded SiGe base
Autorzy:
Zaręba, A.
Łukasiak, L.
Jakubowski, A.
Tematy:
heterojunction bipolar transistor
SiGe
base width modulation
Pokaż więcej
Wydawca:
Instytut Łączności - Państwowy Instytut Badawczy
Powiązania:
https://bibliotekanauki.pl/articles/308625.pdf  Link otwiera się w nowym oknie
Opis:
A model of the position of the edge of emitter-base junction in the base and collector current pre-exponential ideality factor in HBT transistor with a SiGe base is presented. The model is valid for transistors with nonuniform profiles of doping and Ge content. The importance of taking into account the dependence of the effective density of states in SiGe on local Ge content and that of electron diffusion coefficient in SiGe on drift field for modeling accuracy is studied.
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
SiGe HBT wideband amplifier for millimeter wave applications
Autorzy:
Krcmar, M.
Noether, N.
Boeck, G.
Tematy:
wideband amplifier
HBT
SiGe
millimeter wave
bipolar integrated circuits
Pokaż więcej
Wydawca:
Instytut Łączności - Państwowy Instytut Badawczy
Powiązania:
https://bibliotekanauki.pl/articles/307582.pdf  Link otwiera się w nowym oknie
Opis:
A wideband amplifier up to 50 GHz has been implemented in a 0.25 žm, 200 GHz ft SiGe BiCMOS technology. Die size was 0.7×0.73 mm2. The two-stage design achieves more than 11 dB gain over the whole 20 to 50 GHz band. Gain maximum was 14.2 dB at 47.5 GHz. Noise figure was lower than 9 dB up to 34 GHz and a current of 30 mA was drawn from a 4 V supply. To the author's best knowledge this is the highest gain bandwidth product of a monolithic SiGe HBT amplifier ever reported.
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Modeling SiGe-base HBT using APSYS 2000 - a 2D simulator
Autorzy:
Linkowski, A.
Łukasiak, L.
Jakubowski, A.
Tematy:
base transit time
cut-off frequency
HBT
SiGe-base
Pokaż więcej
Wydawca:
Instytut Łączności - Państwowy Instytut Badawczy
Powiązania:
https://bibliotekanauki.pl/articles/308023.pdf  Link otwiera się w nowym oknie
Opis:
The paper is devoted to optimization of SiGe-base HBT with respect to operation speed by means of numerical simulation. The influence of design parameters on f(T) is studied.
Dostawca treści:
Biblioteka Nauki
Artykuł
Autorzy:
Śliwakowski, Maciej
Pellowski, Witalis
Iwan, Agnieszka
Krysiak, Piotr
Bogdanowicz, Krzysztof A.
Gonciarz, Agnieszka
Miedziak, Jacek
Przybyl, Wojciech
Marzec, Monika
Szczepaniak, Marcin
Opis:
The main goal of this review is to comprehensively present the properties of silicon, germanium, and silicon-germanium systems and analyze current possibilities of producing fibers based on them for applications as a photovoltaic fabric for a future soldier. The vision of the future is to produce a feather-light photovoltaic optic fiber, exhibiting mechanical properties typical of Kevlar, enabling power/recharging of portable electric devices while simultaneously protecting against mechanical damage and explosions. This article analyzes, in detail, issues such as the occurrence and mobility of germanium in the environment, the life cycle of SiGe photovoltaic fabrics, ecotoxicological and human health implications, sustainable development strategies and policy implications, and analytical challenges due to low concentrations in the environment. Moreover, the advantages and disadvantages of silicon-based solar cells are analyzed, taking into account various factors, including environmental factors. Finally, the soldier of the future is analyzed.
Dostawca treści:
Repozytorium Uniwersytetu Jagiellońskiego
Artykuł
Tytuł:
Critical modeling issues of SiGe semiconductor devices
Autorzy:
Palankovski, V.
Selberherr, S.
Tematy:
SiGe HBT
numerical simulation
band gap
mobility
small-signal simulation
S-parameters
Pokaż więcej
Wydawca:
Instytut Łączności - Państwowy Instytut Badawczy
Powiązania:
https://bibliotekanauki.pl/articles/308035.pdf  Link otwiera się w nowym oknie
Opis:
We present the state-of-the-art in simulation of silicon-germanium (SiGe) semiconductor devices. The work includes a detailed comparison of device simulators and current transport models. Among the critical modeling issues addressed in the paper, special attention is focused on the description of the anisotropic majority/minority electron mobility in strained SiGe grown on Si. We use a direct approach to obtain scattering parameters (S-parameters) and other derived figures of merit of SiGe heterojunction bipolar transistors (HBTs) by means of small-signal AC-analysis. Results from two-dimensional hydrodynamic simulations of SiGe HBTs are presented in good agreement with measured data. The examples are chosen to demonstrate technologically important issues which can be addressed and solved by device simulation.
Dostawca treści:
Biblioteka Nauki
Artykuł

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